Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

	Nanotech 2008 Vol. 1 Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1 Chapter 4: Nanofabrication & Direct-Write Nanolithography
	Periodic Nanowell Array using Template-Assisted Nanosphere Lithography
Authors:	S. Jung, J. Lee
Affilation:	Seoul National University, KR
Pages:	588 - 591
Keywords:	template assisted nanosphere lithography, nanoimprint lithography
Abstract:	This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as the template. When polystyrene nanoshperes were spin coated on the substrate with the template morphology, they formed a crystal array with improved periodicity in lateral and longitudinal directions. We also demonstrate nanowell array through subsequent deposition and lift-off steps.
ISBN:	978-1-4200-8503-7
Pages:	1,118
Hardcopy:	$159.95

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