Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 1
Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1

Nanofabrication & Direct-Write Nanolithography Chapter 4

Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

Authors: S. Jung, J. Lee

Affilation: Seoul National University, Korea

Pages: 588 - 591

Keywords: template assisted nanosphere lithography, nanoimprint lithography

Abstract:
This paper presents a template-assisted nanosphere lithography(NSL) to obtain high-quality crystal in regularity and coverage(Figure 1). A periodic array of 100-nm deep, 360-450 nm wide nano-trenches was fabricated by nano imprint lithography(NIL), and used as the template. When polystyrene nanoshperes were spin coated on the substrate with the template morphology, they formed a crystal array with improved periodicity in lateral and longitudinal directions. We also demonstrate nanowell array through subsequent deposition and lift-off steps.

Periodic Nanowell Array using Template-Assisted Nanosphere Lithography

ISBN: 978-1-4200-8503-7
Pages: 1,118
Hardcopy: $159.95