Authors: L.E. Ocola, X-M. Lin
Affilation: Argonne National Laboratory, United States
Pages: 578 - 580
Keywords: templated self assembly, nanoparticles, ebeam lithography
Combining top-down electron beam lithography and bottom-up colloidal chemical assembly can potentially lead to large scale patterning of nanocrystals on arbitary substates. Our approach consists of fabrication of templates from hydrogen silsesquioxane (HSQ) on treated silicon wafer surfaces. Trenches of different pitch and other geometrical features, such as triangles, were patterned using a JEOL 9300 FS, 100 KV ebeam lithography tool. The HSQ thickness was around 120 nm. A droplet of gold nanoparticle colloid in toluene was deposited onto this templated substrate. The substrate was subsequently titled to allow liquid to flow off the surface. The results show that 5 nm gold nanoparticles self assemble in trenches less than 40 nm in width using this simple drop-and-flush technique. In addition, we observed additional self assembly on the tops of 200 nm equilateral triangles patterned in HSQ. We are currently investigating the geometrical and physical properties of the template that are necessary to induce large area self assembly. Further progress in templated self assembly will lead to novel nanophotonic and chemical sensing devices, along with the means to extend top-down nanofabrication below the 10 nm barrier.