Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 1
Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1

Nanofabrication & Direct-Write Nanolithography Chapter 4

UV-NIL with optimal droplets

Authors: V. Sirotkin, A. Svintsov, S. Zaitsev

Affilation: IMT RAS, Russian Federation

Pages: 559 - 562

Keywords: step/flash nanoimprint lithography, optimal dispensing

A homogeneous residual layer thickness in nanoimprint lithography (NIL) is a serious problem in step and flash (UV-)NIL. Improvement of thickness homogeneity could be expected from optimized size of droplets at resist dispensing in case of UV-NIL. The optimization in droplet size must exclude the stamp geometry involving areas in which the resist has to flow laterally over large distances so stamp geometry should be considered at optimization. Also the optimization should consider process of resist wetting and spreading at imprint analyzing resist viscous flow. The report is devoted to development of an optimizing algorithm, which take into account only filling factor (geometry) of a stamp and does not consider the following resist flow. In current realization of the approach a specially developed algorithm transfers stamp geometry defined in standard GDSII (or ACAD) format into rectangular (square) cells and calculates the filling factors taking into consideration stamp depth and desirable residual resist thickness. Then depending of the jet model continuous or discreet volume is calculated and saved for further use by control system of a UV-NIL machine.

UV-NIL with optimal droplets

ISBN: 978-1-4200-8503-7
Pages: 1,118
Hardcopy: $159.95