Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 1
Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1

Nanofabrication & Direct-Write Nanolithography Chapter 4

New Method for large Area NIL - SCIL

Authors: J. van Eekelen, J. Weixlberger

Affilation: Suss MicroTec Lithography, Germany

Pages: 556 - 558

Keywords: NIL, large area imprint, non-UV based room temperature process

Abstract:
A new imprint technology for sub-50nm patterning will be introduced, bridging the gap between small rigid stamp application for best resolution and large area soft stamp usage with usual limited printing resolution below 200nm - SCIL Substrate Conformal Imprint Lithography is an enabling technology offering best of two worlds - large area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:10 The technology will be introduced, results for various applications be shown and measurement results confirming pattern fidelity and uniformity will be shown.

New Method for large Area NIL - SCIL

ISBN: 978-1-4200-8503-7
Pages: 1,118
Hardcopy: $159.95