New Method for large Area NIL

	Nanotech 2008 Vol. 1 Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1 Chapter 4: Nanofabrication & Direct-Write Nanolithography
	New Method for large Area NIL - SCIL
Authors:	J. van Eekelen, J. Weixlberger
Affilation:	Suss MicroTec Lithography, DE
Pages:	556 - 558
Keywords:	NIL, large area imprint, non-UV based room temperature process
Abstract:	A new imprint technology for sub-50nm patterning will be introduced, bridging the gap between small rigid stamp application for best resolution and large area soft stamp usage with usual limited printing resolution below 200nm - SCIL Substrate Conformal Imprint Lithography is an enabling technology offering best of two worlds - large area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:10 The technology will be introduced, results for various applications be shown and measurement results confirming pattern fidelity and uniformity will be shown.
ISBN:	978-1-4200-8503-7
Pages:	1,118
Hardcopy:	$159.95

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New Method for large Area NIL - SCIL