Nano Science and Technology Institute
Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 1
Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 4: Nanofabrication & Direct-Write Nanolithography

New Method for large Area NIL - SCIL

Authors:J. van Eekelen, J. Weixlberger
Affilation:Suss MicroTec Lithography, DE
Pages:556 - 558
Keywords:NIL, large area imprint, non-UV based room temperature process
Abstract:A new imprint technology for sub-50nm patterning will be introduced, bridging the gap between small rigid stamp application for best resolution and large area soft stamp usage with usual limited printing resolution below 200nm - SCIL Substrate Conformal Imprint Lithography is an enabling technology offering best of two worlds - large area soft stamps with repeatable sub-50nm printing capability, avoiding stamp deformation as no contact force applied, non-UV based curing at room temperature and allowing high aspect ratios even up to 1:10 The technology will be introduced, results for various applications be shown and measurement results confirming pattern fidelity and uniformity will be shown.
New Method for large Area NIL - SCILView PDF of paper
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