Nanotech 2008 Vol. 1
Nanotech 2008 Vol. 1
Nanotechnology 2008: Materials, Fabrication, Particles, and Characterization - Technical Proceedings of the 2008 NSTI Nanotechnology Conference and Trade Show, Volume 1

Nano Materials & Composites Chapter 2

Towards Automation in the Characterization of Nanostructured Materials and Devices

Authors: K. Weishaupt, U. Schmidt, T. Dieing, O. Hollricher

Affilation: WITec GmbH, Germany

Pages: 325 - 328

Keywords: Raman imaging, AFM

The characterization of nanostructured materials implies knowledge about their chemical and structural properties, leading to a growing demand for characterization methods for heterogeneous materials on the nanometer scale. However, certain properties are difficult to study with conventional characterization techniques due to either limited resolution or the inability to chemically differentiate materials without inflicting damage or using invasive techniques such as staining. By combining various analytical techniques such as Raman spectroscopy, confocal microscopy and AFM in one instrument, the same sample area can be analyzed with all implemented methods, leading to a better understanding of nanostructured materials. Raman spectroscopy, a chemical analysis technique, combined with confocal microscopy enables the unique Raman imaging of heterogeneous materials. The power of Raman imaging stems from the high chemical information content of molecular vibrational spectra. In the Raman spectral imaging mode, a complete Raman spectrum is recorded in every image pixel, leading to a two-dimensional array consisting of ten-thousands of complete Raman spectra. From this array images are extracted by analyzing various spectral features (sum, peak position, peak width, etc). Differences in chemical composition, although completely invisible in optical images, will be apparent in the Raman image and can be analyzed with a resolution down to 200 nm. If higher resolution is required, by simply turning the microscope turret, the confocal Raman microscope can be transformed in to an AFM. Using this imaging technique, structures below the diffraction limit can be visualized from the same sample area. For the analysis of various devices formed on a support, an automated sample positioner with a travel accuracy better than 5 µm is incorporated in the instrument. Special scripting functions allow the automated execution of predefined measurement sequences on any user defined selection of measurement points on the sample, guaranteeing the most comprehensive surface analysis tool for systematic and routine research tasks.

Towards Automation in the Characterization of Nanostructured Materials and Devices

ISBN: 978-1-4200-8503-7
Pages: 1,118
Hardcopy: $159.95