Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon Substrates

	Nanotech 2007 Vol. 4 Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4 Chapter 3: Nanofabrication
	Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon Substrates
Authors:	S. Choi and M. Daugherty
Affilation:	Enable IPC Corporation, US
Pages:	514 - 515
Keywords:	nanowire, silicon, alumina, nanopore, template, CMOS
Abstract:	We have developed a CMOS-compatible process for manufacturing nanowires directly on silicon (or other) substrates. This process removes some of the steps for conventional nanowire manufacture. The result are highly-ordered, high aspect-ratio nanowires for use in a variety of applications (we are concentrating on cathodes for rechargeable lithium ion batteries).
ISBN:	1-4200-6376-6
Pages:	768
Hardcopy:	$139.95

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