Nano Science and Technology Institute
Nanotech 2007 Vol. 4
Nanotech 2007 Vol. 4
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
 
Chapter 3: Nanofabrication
 

Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon Substrates

Authors:S. Choi and M. Daugherty
Affilation:Enable IPC Corporation, US
Pages:514 - 515
Keywords:nanowire, silicon, alumina, nanopore, template, CMOS
Abstract:We have developed a CMOS-compatible process for manufacturing nanowires directly on silicon (or other) substrates. This process removes some of the steps for conventional nanowire manufacture. The result are highly-ordered, high aspect-ratio nanowires for use in a variety of applications (we are concentrating on cathodes for rechargeable lithium ion batteries).
Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon SubstratesView PDF of paper
ISBN:1-4200-6376-6
Pages:768
Hardcopy:$139.95
 
Order:Mail/Fax Form
Up
© 2014 Nano Science and Technology Institute. All Rights Reserved.
Terms of Use | Privacy Policy | Contact Us | Site Map