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 | Nanotech 2007 Vol. 4
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Chapter 3: Nanofabrication |
| | Growth and Engineering of High Aspect-Ratio AAO Templates Integrated on Silicon Substrates | | Authors: | S. Choi and M. Daugherty | | Affilation: | Enable IPC Corporation, US | | Pages: | 514 - 515 | | Keywords: | nanowire, silicon, alumina, nanopore, template, CMOS | | Abstract: | We have developed a CMOS-compatible process for manufacturing nanowires directly on silicon (or other) substrates. This process removes some of the steps for conventional nanowire manufacture. The result are highly-ordered, high aspect-ratio nanowires for use in a variety of applications (we are concentrating on cathodes for rechargeable lithium ion batteries). | | ISBN: | 1-4200-6376-6 |
| Pages: | 768 |
| Hardcopy: | $199.99 |
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