Nano Science and Technology Institute
Nanotech 2007 Vol. 4
Nanotech 2007 Vol. 4
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
 
Chapter 3: Nanofabrication
 

Numerical Simulation of NIL Process Based on Continuum hypothesis

Authors:S.M. Kim, Y.S. Woo, D.E. Lee and W.I. Lee
Affilation:Seoul Nat'l Univ., KR
Pages:442 - 445
Keywords:free surface, volume-of-fluid method, VOF method, surface tension, wall adhesion, lithography
Abstract:Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this study, an analytic investigation was performed for the NIL process of transferring nano-scale patterns onto polymeric films. Process optimization calls for a thorough understanding of polymer flow during the process. We carried out 2D and 3D numerical analyses of polymer flow during NIL process. The simulation incorporated continuum-hypothesis and the effects of surface tension were taken into account. The numerical model also employed a proper viscosity model for polymeric liquid. For a more effective prediction of free surface, fixed grid scheme with the volume of fluid (VOF) method were used. A parametric study was performed for various process conditions and the simulation results were verified with experimental results qualitatively.
Numerical Simulation of NIL Process Based on Continuum hypothesisView PDF of paper
ISBN:1-4200-6376-6
Pages:768
Hardcopy:$139.95
 
Order:Mail/Fax Form
Up
© 2014 Nano Science and Technology Institute. All Rights Reserved.
Terms of Use | Privacy Policy | Contact Us | Site Map