Nanotech 2007 Vol. 4
Nanotech 2007 Vol. 4
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4

Nanofabrication Chapter 3

Numerical Simulation of NIL Process Based on Continuum hypothesis

Authors: S.M. Kim, Y.S. Woo, D.E. Lee and W.I. Lee

Affilation: Seoul Nat'l Univ., Korea

Pages: 442 - 445

Keywords: free surface, volume-of-fluid method, VOF method, surface tension, wall adhesion, lithography

Abstract:
Nano imprint lithography(NIL) is a cost-efficient, high-throughput processing technique to transfer nano-scale patterns onto thin polymer films. Polymers used as the resist include UV cured resins as well as thermoplastics such as polymethyl-methacrylate(PMMA). In this study, an analytic investigation was performed for the NIL process of transferring nano-scale patterns onto polymeric films. Process optimization calls for a thorough understanding of polymer flow during the process. We carried out 2D and 3D numerical analyses of polymer flow during NIL process. The simulation incorporated continuum-hypothesis and the effects of surface tension were taken into account. The numerical model also employed a proper viscosity model for polymeric liquid. For a more effective prediction of free surface, fixed grid scheme with the volume of fluid (VOF) method were used. A parametric study was performed for various process conditions and the simulation results were verified with experimental results qualitatively.

Numerical Simulation of NIL Process Based on Continuum hypothesis

ISBN: 1-4200-6376-6
Pages: 768
Hardcopy: $139.95