Nanotech 2007 Vol. 4
Nanotech 2007 Vol. 4
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4

Nanoparticles Chapter 2

Prevention of Coalescence Stage from Nuclei at Initial Growth of Thin Film by Substrate Rotation in Physical Vapour Deposition

Authors: S-K Koh, J.H. Lee, Y.G. Han, J-S Cho, J.H. Joo and E.A. Kralkina

Affilation: P&I Corp., Korea

Pages: 265 - 268

Keywords: nano particles, nuclei formation, PVD, substrate rotation

Abstract:
A method of nanoparticle fabrication in physical vapor deposition was introduced. Metal were deposited on the powdery substrate which were stirred by rotors. Particle size and prodcuction rate of metal nano particles were controlled by types of substrate, rotation speed of the substrate and evaporation rate of the metal in order to form well distribute nano particles(1-10nm). Nucleation phenomena on the substrate is examined by SEM, TEM, XPS, UV spectra, conductivity measurment, etc. Current industrial applications, comparision with conventional methods, prodcution yield, etc. are discussed.

Prevention of Coalescence Stage from Nuclei at Initial Growth of Thin Film by Substrate Rotation in Physical Vapour Deposition

ISBN: 1-4200-6376-6
Pages: 768
Hardcopy: $139.95