Nano Science and Technology Institute
Nanotech 2007 Vol. 4
Nanotech 2007 Vol. 4
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 4
Chapter 1: Nanoscale Characterization

Analytical Methods for Nanotechnology

Authors:I.A. Mowat, J. Moskito, I Ward and A. Hartzell
Affilation:Evans Analytical Group, US
Pages:20 - 23
Keywords:surface, contamination, analysis, reliability
Abstract:Growth in the fabrication of micro- and nano- engineered materials and systems has led to increased demand for analytical and characterization methods for these materials and systems. Many of the new manufacturing methods are extensions of established processes (e.g. MEMS manufacturing using traditional semiconductor processing). In contrast, some material growth methods do not have connections to prior technology, leading to challenges in the characterization, assessment and qualification of new materials. For example, nano-products with high surface area-to-volume ratios are more sensitive to impurities and microcontamination during processing than larger geometry products. New manufacturing methods, materials and processes generally have the same concerns that previously existed for advanced technologies (e.g. cleanliness, contamination, yield, reliability etc.) However, there are additional concerns regarding health and the environment, including nanoparticle exposure during manufacturing, shipment, and product use. This paper will demonstrate contributions that surface analysis can make towards problem solving during the manufacture and reliability characterization of new materials. These techniques include: SEM, AFM, XPS, SIMS, TOF-SIMS and Auger electron spectroscopy. Examples of these techniques as problem solving and characterization tools will be given, along with a discussion of their relative strengths and weaknesses with regards to sensitivity, information depth and analytical dimensions.
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