Authors: Y-J Pan and R-J Yang
Affilation: National Cheng Kung University, Taiwan
Pages: 367 - 370
Keywords: UV epoxy resin, microfluidics, Poly(dimethylsiloxane)
This paper presents two methods for the production of UV epoxy resin masters for the replication of PDMS-based microfluidic chips. The epoxy resin master can be either fabricated by using a negative glass template which achieved utilizing conventional lithography technique or exposing a layer of UV epoxy resin coated on a glass substrate to a UV light source through a patterned transparency mask. It is shown that the latter method enables the epoxy master to be produced without the need for a photolithography region in a clean room and can be completed in 40 minutes or less. The rigid extent of the epoxy resin master is also tested. The result shows that the epoxy resin master has nearly no damage after replica process had been executed 30 times. An electrokinetic focusing experiment is performed using a PDMS microchip replicated from the epoxy resin master. The experimental results obtained for the width of the electrokinetically focused sample stream under different focusing ratios are found to be in good agreement with theoretical predictions.