Nano Science and Technology Institute
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 1
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
 
Chapter 5: Nanostructured Materials and Devices
 

Atmospheric Pressure Ion Deposition - Selected applications

Authors:L. Nu├čbaumer, R. Saf and M. Piber
Affilation:Institute for Chemistry and Technology of Organic Materials, AT
Pages:360 - 363
Keywords:APID, thin structured films
Abstract:Atmospheric Pressure Ion Deposition: a novel experimental setup allows the processing of various materials (e.g. polymers, small molecules, nanoparticles and biomolecules) into thin structured films.This method generates by means of electrostatic forces a fine dispersed charged aerosol from solutions of these materials and deposite it through electrostatic lenses to a moveable target. APID enables to control film thickness up to a few nanometres and to fabricate 2- and 3-dimensional structures.To demonstrate the advantages and opportunities of this method, new applications in the field of solar cells, doped fluorescent oxides and bioactive materials as well as thin structured films will be presented.This technology is able to prepare films with different chemical compositions and structures and offers a lot of new perspectives in processing such materials to thin films and/or three dimensional structures.
Atmospheric Pressure Ion Deposition - Selected applicationsView PDF of paper
ISBN:1-4200-6182-8
Pages:726
Hardcopy:$139.95
 
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