Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 1
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1

Lithography and Patterning Chapter 4

Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication

Authors: B.C. Lee, M.H. Kim, H.J. Shin and S. Moon

Affilation: Korea Institute of Science and Technology, Korea

Pages: 279 - 282

Keywords: nanowire, NEMS, nanoscale etch, MPOM, MPOL, electroless plating, selective etching

Abstract:
In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of about 30nm/times through whole wafer level and we proposed a novel top-down fabrication process, the metal peel-off lithograph(MPOL), to pattern and form metal nanowires.

Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication

ISBN: 1-4200-6182-8
Pages: 726
Hardcopy: $139.95