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 | Nanotech 2007 Vol. 1
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 4: Lithography and Patterning |
| | Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication | | Authors: | B.C. Lee, M.H. Kim, H.J. Shin and S. Moon | | Affilation: | Korea Institute of Science and Technology, KR | | Pages: | 279 - 282 | | Keywords: | nanowire, NEMS, nanoscale etch, MPOM, MPOL, electroless plating, selective etching | | Abstract: | In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of about 30nm/times through whole wafer level and we proposed a novel top-down fabrication process, the metal peel-off lithograph(MPOL), to pattern and form metal nanowires. | | ISBN: | 1-4200-6182-8 |
| Pages: | 726 |
| Hardcopy: | $199.99 |
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