Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication

	Nanotech 2007 Vol. 1 Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1 Chapter 4: Lithography and Patterning
	Thickness-controlled Metal Nanoscale Etch for Proposed Metal Nanowires Fabrication
Authors:	B.C. Lee, M.H. Kim, H.J. Shin and S. Moon
Affilation:	Korea Institute of Science and Technology, KR
Pages:	279 - 282
Keywords:	nanowire, NEMS, nanoscale etch, MPOM, MPOL, electroless plating, selective etching
Abstract:	In this works, we developed a novel nanoscale etch process of metallic structures, the metal peel-off method(MPOM), to realize proposed fabrication of metal nanowires. Using this method, we simply and uniformly self-controlled etching rate of about 30nm/times through whole wafer level and we proposed a novel top-down fabrication process, the metal peel-off lithograph(MPOL), to pattern and form metal nanowires.
ISBN:	1-4200-6182-8
Pages:	726
Hardcopy:	$139.95

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