Nano Science and Technology Institute
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 1
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 4: Lithography and Patterning

Gas Phase Nanoparticle Integration

Authors:C.R. Barry and H.O. Jacobs
Affilation:University of Minnesota, US
Pages:261 - 264
Keywords:nanoxerography, coulomb, fringing field, charge, assembly, nanoparticles
Abstract:We report on two gas phase nanoparticle integration processes to assemble nanoparticles and other nanomaterials onto desired areas on a substrate. We expect these processes to work with any material that can be charged including organic and inorganic, metallic, semiconducting, and insulating materials. The processes offer self-aligned integration and could be applied to site specific nanowire growth via positioned catalyst seeds, integrated single crystal silicon nanoparticle transistors, or other nanomaterial devices requiring assembly onto desired surface areas. They could also be extended to externally biased surface electrodes that could be programmed to enable the integration of more than one material type. The Nanoxerographic printing process directs the assembly of nanoparticles onto charged surface areas with sub-100 nm resolution. The Fringing Field Directed Assembly approach directs the assembly of nanoparticles onto desired areas on nanostructured thin films with 50 nm lateral resolution.
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