Nano Science and Technology Institute
Nanotech 2007 Vol. 1
Nanotech 2007 Vol. 1
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
 
Chapter 2: Nano Electronics & Photonics
 

Kinetic Monte Carlo Study on Silicon Pre-Implant Technique

Authors:J.S. Kim, Y.K. Kim, K.S. Yoon and T. Won
Affilation:Inha univ., KR
Pages:115 - 118
Keywords:kinetic Monte Carlo, Boron
Abstract:In this work, we investigated the effect of Si pre-implantation on the low energy B implant and boron activation enhancement during the post-implant annealing process using KMC. For investigating Si pre implantation effect, Si implantation is performed with dosage of 3 x 1014 /cm2 and with implantation energy of 200 keV. Further, B implantation is performed with dosage of 4.5 x 1015/cm2 and implantation energy 2 keV, followed by annealing process is performed at 790 C for 18 sec.
Kinetic Monte Carlo Study on Silicon Pre-Implant TechniqueView PDF of paper
ISBN:1-4200-6182-8
Pages:726
Hardcopy:$139.95
 
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