| |
 | Nanotech 2007 Vol. 1
Technical Proceedings of the 2007 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 2: Nano Electronics & Photonics |
| | Kinetic Monte Carlo Study on Silicon Pre-Implant Technique | | Authors: | J.S. Kim, Y.K. Kim, K.S. Yoon and T. Won | | Affilation: | Inha univ., KR | | Pages: | 115 - 118 | | Keywords: | kinetic Monte Carlo, Boron | | Abstract: | In this work, we investigated the effect of Si pre-implantation on the low energy B implant and boron activation enhancement during the post-implant annealing process using KMC. For investigating Si pre implantation effect, Si implantation is performed with dosage of 3 x 1014 /cm2 and with implantation energy of 200 keV. Further, B implantation is performed with dosage of 4.5 x 1015/cm2 and implantation energy 2 keV, followed by annealing process is performed at 790 C for 18 sec. | | ISBN: | 1-4200-6182-8 |
| Pages: | 726 |
| Hardcopy: | $199.99 |
|
| Order: | Mail/Fax Form |
| Special: | 3 CD Set — 15% off with Free Shipping |
| Up | |
|
| nanoPRwire™ |
 |
| News Headlines |
 |
|
|
| |
| |
|
| | |
| |
|
|
