Authors: M. Miura-Mattausch, D. Navarro, N. Sadachika, G. Suzuki, Y. Takeda, M. Miyake, T. Warabino, K. Machida, T. Ezaki, H.J. Mattausch, T. Ohguro, T. Iizuka, M. Taguchi, S. Kumashiro, R. Inagaki and S. Miyamoto
Affilation: Hiroshima University, Japan
Pages: 638 - 643
Keywords: MOSFET, comapct model, surface potential, RF applications
The compact model HiSIM2 supports RF-circuit applications with advanced MOSFETs and is a further development of HiSIM1 which has been released since 2001 for public usage. Important features, required for the real applications, are summarized. In particular, HiSIM2 models advanced MOSFET technologies by determining the surface potentials from the Poisson equation with a minimum number of approximations.