Nanotech 2006 Vol. 3
Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3
Chapter 2: Nanoscale Fabrication
Approximate Pattern Matching in Nanotechnology
|Authors:||V. Annampedu and M.D. Wagh|
|Affilation:||Agere Systems Inc., US|
|Pages:||316 - 319|
|Keywords:||pattern matching, RTD, architecture, threshold, MOBILE|
|Abstract:||Approximate pattern matching is comparing an unknown pattern with a database of stored patterns with a specified error tolerance. This ability to compensate for real world sensor errors makes approximate pattern matching an ideal choice for a wide range of applications. This paper provides a nanotechnology solution to this problem using Resonant Tunneling Diode (RTD) and heterostructure field effect transistor (HFET) circuits.|
We show that an n-bit pattern can be recognized by a single stage MOBILE architecture with n+3 RTDs. All the RTDs in this circuit have the same area except one, whose area is determined by the pattern and the error tolerance. Further, two arbitrary n-bit patterns can be matched (within any specified error tolerance between 0 and n) by a one stage programmable MOBILE with 2n+3 RTDs. All the RTDs in this case have the same area, except one, that has half the area. Thus in this case, the hardware is independent of the patterns and the error tolerance and hence has universal applications.
A significant amount of research is already available in the technology of nanodevices. By putting focus on a novel application of these devices, this paper bridges the gap between device physics and practice.
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