Production of Nanodots by Ion Sputtering on Mechanical Polished (110) Si-Substrates

	Nanotech 2006 Vol. 3 Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3 Chapter 2: Nanoscale Fabrication
	Production of Nanodots by Ion Sputtering on Mechanical Polished (110) Si-Substrates
Authors:	C. Ballesteros, A. Rodríguez and T. Rodríguez
Affilation:	Universidad Carlos III de Madrid, ES
Pages:	174 - 177
Keywords:	nanodots, ion sputtering, TEM
Abstract:	We report a new method to deposit Cu nanocrystals by 5kV Ar+ ion sputtering of Cu metallic ribbons at glazing incidence, 8º, on top of (110) Si-substrates mechanical polished down to a 0.1 μm finish. The Si- substrate was placed into a rotating specimen holder at the same plane that the Cu ribbons and was maintained at liquid nitrogen temperature in an oil-free vacuum of 2x10-4 torr. The used glazing incidence of the Ar+ ions magnified the sputtering yield and the surface scratches induced by the mechanical polishing favoured the formation of a quasi-ordered array of nanodots.
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ISBN:	0-9767985-8-1
Pages:	913
Hardcopy:	$119.95

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