Authors: M. Nuzaihan, U. Hashim, N.H.A. Halim and S.N.M. Bajuri
Affilation: Northern Malaysia University College of Engineering, Malaysia
Pages: 266 - 269
Keywords: electron beam lithography, nanowire, scanning electron microscope, positive tone e-beam resist, negative tone e-beam resist
Experimental studies of nanowires formation are carried out. The nanowires are fabricated using Scanning Electron Microscope Based Electron Beam Lithography (EBL) Technique with critical dimensions in less than 100nm. In order to complete the design cycle for the best nanowire, many contributing factors are of concerned including electron beam resists, resolution, working area/write field, structure size, step size, beam current, dose factor, exposure parameters and exposure time. The nanowires designed by the powerful RAITH ELPHY Quantum GDSII Editor, which is a CAD program for EBL and directly transferred on the sample coated with positive tone and negative tone e-beam resist. Comparison profiles and dimensions of both e-beams are included and discussed in this paper.