Nano Science and Technology Institute
Nanotech 2006 Vol. 3
Nanotech 2006 Vol. 3
Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 3
Chapter 2: Nanoscale Fabrication

High-density Optical Disk Mastering Using Electron Beam Lithography with Modified LIGA Demolding Mechanism

Authors:C.H. Chao and C.T. Pan
Affilation:National Sun Yat-Sen University, TW
Pages:262 - 265
Keywords:mastering, high-density, electron beam, lithography, Ni-Co, LIGA
Abstract:In the study, a spiral nano-groove with 110nm in linewidth and 80nm in depth has been successfully fabricated. This method, Optical disk mastering using electron beam lithography, could provide about 50Gbytes storage capacity and is available for mass production.
The critical issue of electron beam lithography is its throughput, which prevents this technique from the mainstream of VLSI manufacturing. 40Gb/in2 was fabricate using direct writing method, with which mass production could not be achieved. Our team have research activities on this topics, we had reduced the linewidth of electron beam mastering.
The technique of Ni-Co electroplating process with hardness larger than Hardness of Vicker (Hv) 650 was developed. Ni-Co mold was served as master for hot embossing process to replicate the nano-pattern onto PMMA sheet..
The modified LIGA process consists of electron beam lithography, extra-hard Ni-Co electroplating process (as a metal mold) and chemical mechanic polishing (CMP) process for producing a metal mold of the optical disk, with which hot embossing process onto PMMA sheet was conducted as shown in Fig.2. The study also presents an innovative demolding mechanism to demold the master from the PMMA sheet without damaging the nanometer patterns.
High-density Optical Disk Mastering Using Electron Beam Lithography with Modified LIGA Demolding MechanismView PDF of paper
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