Modeling of multi-scale processes during plasma-assisted growth of carbon nanotubes

	Nanotech 2006 Vol. 1 Technical Proceedings of the 2006 NSTI Nanotechnology Conference and Trade Show, Volume 1 Chapter 7: Nanoscale Modeling
	Modeling of multi-scale processes during plasma-assisted growth of carbon nanotubes
Authors:	A.V. Vasenkov and V.I. Kolobov
Affilation:	CFD Research Corporation, US
Pages:	617 - 620
Keywords:	multi-scale computational framework, multi-wall and single-wall carbon nanotubes, chemical vapor deposition, plasma
Abstract:	Multi-Scale Computational Framework (MSCF) has been recently developed for nanostructured materials’ fabrication. This framework integrates a Computational Fluid Dynamic solver for computing reactor scale process, a Kinetic Monte Carlo simulator for the growth of nanostructured material, and an Molecular Dynamic software for computing rates of self-assembly processes. In this study, the MSCF was used to investigate the growth of carbon nanotubes (CNT) in a C2H2/H2 inductively coupled plasma systems. It was found that MSCF is capable of predicting paths for delivering carbon onto catalyst/CNT interface and formation of single wall or multi-wall CNTs depending on the shape of catalyst. The differences in the growth of CNTs in the plasma-assisted and vapor deposition systems are discussed.
	View PDF of paper
ISBN:	0-9767985-6-5
Pages:	871
Hardcopy:	$119.95

Order:	Mail/Fax Form
Special:	3 CD Set — 15% off with Free Shipping
Up