Authors: H-C Yuan, M.M. Roberts, D.E. Savage, M.G. Lagally, Z. Ma and G.K. Celler
Affilation: University of Wisconsin-Madison, United States
Pages: 68 - 71
Keywords: elastic strain sharing, nanomembrane, Si, SiGe, transferable
We demonstrate the fabrication of free standing Si, SiGe, and Si/SiGe/Si membranes and the ability to transfer them onto various kinds of host substrates. In addition to the unstrained Si, SiGe membranes, strained Si is realized from Si/SiGe/Si film stack through elastic strain sharing between SiGe alloy and Si layers. We have fabricated thin-film transistors (TFTs) using either high-temperature or low-temperature process on the transferred membranes and demonstrate high current drive capability. This technique also enables numerous possibility of hetero-material integration.