Nano Science and Technology Institute
Nanotech 2005 Vol. 3
Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3
 
Chapter 8: MEMS/NEMS Design and Applications
 

Computer-Based Process Design Support for MEMS

Authors:A. Wagener, J. Popp, T. Schmidt and K. Hahn
Affilation:University of Siegen, DE
Pages:509 - 512
Keywords:process tools, process design, TCAD, methodology, MEMS
Abstract:A process management and development system for MEMS design is introduced. It allows the specification of processes for specific applications and the tracking of the development procedures. Unlike in microelectronics the process configuration for MEMS is strongly coupled to the intended application. Process engineers on the one side and designers defining the structure on the other side are therefore target user for the system. Configured process flow can be checked with regard to internal consistency. Means to convert the process sequence to a 3-dim layer structure and vice versa are provided as well as assessment tools to compare process variations. The system is based on a dedicated database environment that is able to store and manage all process related design constraints and development related data linked to the fabrication process data itself. The interdependencies between application specific processes and all stages of the design flow will be discussed and a software system will be introduced meeting the requirements of this new approach.
Computer-Based Process Design Support for MEMSView PDF of paper
ISBN:0-9767985-2-2
Pages:786
Hardcopy:$109.95
 
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