![]() | Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3
Chapter 3: Nano Devices and Architectures |
The Design of a Silicon Wire DRAM Cell for Very Dense DRAM Architectures | |
| Authors: | A. Bindal and K. Aflatooni |
| Affilation: | San Jose State University, US |
| Pages: | 244 - 247 |
| Keywords: | DRAM, nano wire, silicon wire, vertical FET |
| Abstract: | In this study, we propose a new DRAM cell that uses a silicon-wire pass transistor stacked on top of a high-dielectric capacitor rated of holding industry-standard 32 fCoulomb charge. We show that the performance of the transistor and the characteristics of the DRAM cell are comparable with those reported in the literature. |
![]() | View PDF of paper |
| ISBN: | 0-9767985-2-2 |
| Pages: | 786 |
| Hardcopy: | $109.95 |
| Order: | Mail/Fax Form |
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