Nanotech 2005 Vol. 3
Nanotech 2005 Vol. 3
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 3

Nanoscale Device and Process Modeling Chapter 1

Modeling of Size Quantization in Strained Si-nMOSFETs with the Improved Modified Local Density Approximation

Authors: C.D. Nguyen, C. Jungemann and B. Meinerzhagen

Affilation: Technical University Braunschweig, Germany

Pages: 33 - 36

Keywords: MOS devices, quantization effects, inversion layer, strained Si

Abstract:
An Improved Modified Local Density Approximation (IMLDA) model for the electron inversion layer in strained Si-nMOSFETs is presented which correctly describes the impact of size quantization on the threshold voltage and capacitance without increasing the computation time. The IMLDA model yields results consistent with the self-consistent solution of the Schroedinger and Poisson equations (SE/PE) for a wide range of strain, temperature and doping concentrations. A big advantage of the IMLDA model is its low computation time and its numerical robustness, because it depends only on local quantities and not on solution variables of the numerical model. Additionally, this model is well suited for software implementation in existing TCAD device simulators.

Modeling of Size Quantization in Strained Si-nMOSFETs with the Improved Modified Local Density Approximation

ISBN: 0-9767985-2-2
Pages: 786
Hardcopy: $109.95