Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 2
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2

NEMS and MEMS Fabrication Chapter 7

A Novel Method of Fabricating Optical Gratings Using the One Step DRIE Process on SOI Wafers

Authors: A.W. Cooper, P.T. Docker and M.C. Ward

Affilation: The University of Birmingham, United Kingdom

Pages: 508 - 510

Keywords: DRIE, gratings, SOI, dry release

Abstract:
This paper describes a novel technique for manufacturing optical gratings by using the one step DRIE (Deep Reactive Ion Etching) process. Using the notching effect documented in previous work when working with silicon on insulator (SOI) wafers, fully released intact gratings have now been produced.

A Novel Method of Fabricating Optical Gratings Using the One Step DRIE Process on SOI Wafers

ISBN: 0-9767985-1-4
Pages: 808
Hardcopy: $109.95