Nano Science and Technology Institute
Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 2
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
 
Chapter 7: NEMS and MEMS Fabrication
 

A Novel Method of Fabricating Optical Gratings Using the One Step DRIE Process on SOI Wafers

Authors:A.W. Cooper, P.T. Docker and M.C. Ward
Affilation:The University of Birmingham, UK
Pages:508 - 510
Keywords:DRIE, gratings, SOI, dry release
Abstract:This paper describes a novel technique for manufacturing optical gratings by using the one step DRIE (Deep Reactive Ion Etching) process. Using the notching effect documented in previous work when working with silicon on insulator (SOI) wafers, fully released intact gratings have now been produced.
A Novel Method of Fabricating Optical Gratings Using the One Step DRIE Process on SOI WafersView PDF of paper
ISBN:0-9767985-1-4
Pages:808
Hardcopy:$109.95
 
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