 | Nanotech 2005 Vol. 2
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Chapter 7: NEMS and MEMS Fabrication |
Application of Magnetic Neutral Loop Discharge Plasma in Deep Quartz and Silicon Etching Process for MEMS/NEMS Devices Fabrication | |
| Authors: | Y. Morikawa, T. Hayashi, K. Suu and M. Ishikawa |
| Affilation: | ULVAC, Inc., JP |
| Pages: | 501 - 503 |
| Keywords: | deep etching, NLD, plasma, modulation |
| Abstract: | ULVAC’s Si deep etching technique has achieved high etching rate as high as 20 um/min as well as extremely high selectivity over resist mask as high as 100 or higher ensuring good etching performance. |
 | View PDF of paper |
| ISBN: | 0-9767985-1-4 |
| Pages: | 808 |
| Hardcopy: | $109.95 |
| Order: | Mail/Fax Form |
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