Nanotech 2005 Vol. 2
Nanotech 2005 Vol. 2
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2

Micro and Nano Structuring and Assembly Chapter 6

NEMS Mass Sensor by Focused Ion Beam Fabrication

Authors: B. Boonliang, P.D. Prewett, M.C.L. Ward and P.T. Docker

Affilation: Birmingham University, United Kingdom

Pages: 416 - 419

Keywords: MEMS NEMS, resonators, mass sensor

Due to rising industrial demands (food, biology, control), there is a drive to develop smaller, more sensitive sensor-devices with real-time capability. The objective of this work is to utilise Focused Ion Beam (FIB) fabrication technology to manufacture a MEMS/NEMS device for mass/chemical sensor. The device is made out of Si3N4 membrane of 200 nm thickness. The design is shown in Fig 1. The device is to be working in dynamic mode (shift in resonant frequency upon mass addition). MathCAD and ABACUS FEA packages are used to predict the characteristic properties of the device. This work reports the design, analysis and initial stages of manufacturing this device.

NEMS Mass Sensor by Focused Ion Beam Fabrication

ISBN: 0-9767985-1-4
Pages: 808
Hardcopy: $109.95