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 | Nanotech 2005 Vol. 2
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 2
Chapter 12: Nanotechnology: Novel Product Development |
| | NILCom® – Commercialization of Nanoimprint Lithography | | Authors: | H. Luesebrink, T. Glinsner, Ch. Moormann, M. Bender and A. Fuchs | | Affilation: | EV Group, AT | | Pages: | 747 - 750 | | Keywords: | NILCom, nanoimprint, infrastructure, standardization, nanoelectronics, life sciences, nano patterning, defect control | | Abstract: | NILCom is a consortium and technology platform for Nanoimprint Lithography (NIL) processes. NILCom offers the opportunity to leverage NIL synergies and support market segment acceleration for processes and infrastructure in its main areas of interest: nanoelectronics, life sciences, data storage and opto electronics. The technology platform offers qualification opportunities for commercially available templates, stamps, resists and substrates, processing equipment and metrology continuously taking advantage of developments along the International Technology Roadmap for Semiconductors in following ongoing scaling requirements in the nanometer regime driven by Moor’s Law. The qualified processes build upon results in large scale ultraviolet based nanoimprint lithography and hot embossing developments aiming to provide an off-the-shelf manufacturing platform for top-down nano patterning. Of particular interest is the demonstration of nanoimprint technologies as contenders to 193nm optical lithography with detailed results and demonstrations in defect control. Process capabilities are inherently connected to design methodology to support device development and manufacturing. | | ISBN: | 0-9767985-1-4 |
| Pages: | 808 |
| Hardcopy: | $165.00 |
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| Order: | Mail/Fax Form |
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