Nanotech 2005 Vol. 1
Nanotech 2005 Vol. 1
Technical Proceedings of the 2005 NSTI Nanotechnology Conference and Trade Show, Volume 1

Bio Nano Materials Chapter 6

Regular Nano-Pores Fabricated By UV Cross-Linking Non-softbaked SU-8 Resist In a Solvent Evaporation Controlled Environment

Authors: C-J Chang, F-G Tseng and C-S Yang

Affilation: National Tsing Hua University, Taiwan

Pages: 296 - 299

Keywords: nanopores, SU-8, UV-crosslinking

Abstract:
This paper proposes a novel technology to fabricate 3D nano pore structures in SU-8 resist, a widely employed resist in MEMS and Bio-chips. Controlling the evaporation rate in SU-8 fabrication process, regular porous structures with pore size close to tens nm can be obtained. Fluorescent dye and glucose has been tested passing through this porous material while not through standard processed SU-8 resist film. This simple process provides a novel way to fabricate patternable molecular filter with SU-8 resist of regular nano sized pores.

Regular Nano-Pores Fabricated By UV Cross-Linking Non-softbaked SU-8 Resist In a Solvent Evaporation Controlled Environment

ISBN: 0-9767985-0-6
Pages: 844
Hardcopy: $109.95