Nano Science and Technology Institute
WCM 2005
WCM 2005
Technical Proceedings of the 2005 Workshop on Compact Modeling
 
Chapter 3: WCM 2004 Invited Papers
 

Noise Modeling with HiSIM Based on Self-Consistent Surface-Potential Description

Authors:M. Miura-Mattausch, S. Hosokawa, D. Navarro, S. Matsumoto, H. Ueno, H.J. Mattausch, T. Ohguro, T. Iizuka, M. Taguchi, T. Kage, and S. Miyamoto
Affilation:Hiroshima University, JP
Pages:229 - 232
Keywords:MOSFET model, noise measurement, surface potential, HiSIM
Abstract:Accurate prediction of noise characteristics is a prerequisite for RF-circuit simulation. We demonstrate here that the 1/f noise is modeled only with the trap density as a model parameter and the thermal drain noise is determined only by the I-V characteristics even for short-channelMOSFETs. Good agreement with measurements is the justification of the model implemented in HiSIM, the circuit simulation model based on a full surface-potential description. The thermal drain-noise coefficient of short-channel MOSFETs increases from 2/3 under the saturation condition. The origin is explained by the potential increase along the channel.
Noise Modeling with HiSIM Based on Self-Consistent Surface-Potential DescriptionView PDF of paper
ISBN:0-9767985-3-0
Pages:412
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