Mobility Extraction and Compact Modeling for FETs Using High-K Gate Materials

	WCM 2005 Technical Proceedings of the 2005 Workshop on Compact Modeling Chapter 1: Invited Papers
	Mobility Extraction and Compact Modeling for FETs Using High-K Gate Materials
Authors:	R.W. Dutton, Y. Liu, C.-H. Choi and T.W. Chen
Affilation:	Stanford University, US
Pages:	31 - 34
Keywords:	effective mobility, gate tunneling, charge pumping, non-quasi-static, compact model
Abstract:	This simulation work discusses the impact of direct gate tunneling on effective mobility extraction methods, particularly the Inversion Charge Pumping (ICP) method proposed recently for transistors with high-k gate dielectrics. The valence-band electron gate tunneling (VBET)-induced substrate current is found to be critical to correctly reconstructing the drain current at high gate biases. The ICP technique is shown to be error-prone in the presence of non-negligible gate tunneling currents. The importance of the compact modeling of the charge pumping effect is also discussed for transistors operating in the large signal, non-quasi-static (NQS) regime. The channel segmentation approach is demonstrated to be suitable for such a purpose.
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ISBN:	0-9767985-3-0
Pages:	412
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