Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

	Nanotech 2004 Vol. 3 Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 3 Chapter 7: Surfaces and Films
	Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology
Authors:	J.A. Dagata, C.A. Richter, R.M. Silver, E. Vogel and J.V. Martinez de Pinillos
Affilation:	NIST, US
Pages:	354 - 357
Keywords:	nanolithography, thin films, gate dielectrics, nanoelectronics, molecular electronics
Abstract:	The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentation will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.
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ISBN:	0-9728422-9-2
Pages:	561
Hardcopy:	$79.95

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