Authors: J.A. Dagata, C.A. Richter, R.M. Silver, E. Vogel and J.V. Martinez de Pinillos
Affilation: NIST, United States
Pages: 354 - 357
Keywords: nanolithography, thin films, gate dielectrics, nanoelectronics, molecular electronics
The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentation will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.