Nanotech 2004 Vol. 3
Nanotech 2004 Vol. 3
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 3

Surfaces and Films Chapter 7

Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

Authors: J.A. Dagata, C.A. Richter, R.M. Silver, E. Vogel and J.V. Martinez de Pinillos

Affilation: NIST, United States

Pages: 354 - 357

Keywords: nanolithography, thin films, gate dielectrics, nanoelectronics, molecular electronics

Abstract:
The National Institute of Standards and Technology has provided and continues to provide critical metrology development for the semiconductor manufacturing industry as it moves from the microelectronic era into the nanoelectronic era. This presentation will describe the National Semiconductor Metrology Program, including a detailed discussion of several projects: Nanolithography Using Scanning Probe Oxidation; Atomic-Level Film Characterization; and Nanoelectronic Device Characterization.

Metrology Development for the Nanoelectronics Industry at the National Institute of Standards and Technology

ISBN: 0-9728422-9-2
Pages: 561
Hardcopy: $79.95