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 | Nanotech 2004 Vol. 2
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 2
Chapter 6: MEMS Modeling |
| | Using Topology Derived Masks to Facilitate 3D Design | | Authors: | R. Schiek and R. Schmidt | | Affilation: | Sandia National Laboratories, US | | Pages: | 291 - 294 | | Keywords: | topology, mask, MEMS, design, optimization | | Abstract: | To accelerate MEMS design for surface micromachining applications, an algorithm and associated design tool have been created which translates designers’ 3D models into 2D lithographic production masks. Typically, designing a surface micromachined, MEMS device requires the creation of a two-dimensional mask set describing how layers of material are used to construct the three-dimensional object. Mask sets are specific to a fixed production process and are effectively the tooling required to manufacture a device. This design tool was developed and implemented such that when given a three-dimensional object it can infer from the object’s topology the two-dimensional masks needed to produce that object with surface micromachining. The masks produced by this design tool can be generic, process independent masks or, if given process constraints, specific for a target process allowing 3D designs to be carried across multiple processes. | | ISBN: | 0-9728422-8-4 |
| Pages: | 519 |
| Hardcopy: | $150.00 |
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