Using Topology Derived Masks to Facilitate 3D Design

	Nanotech 2004 Vol. 2 Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 2 Chapter 6: MEMS Modeling
	Using Topology Derived Masks to Facilitate 3D Design
Authors:	R. Schiek and R. Schmidt
Affilation:	Sandia National Laboratories, US
Pages:	291 - 294
Keywords:	topology, mask, MEMS, design, optimization
Abstract:	To accelerate MEMS design for surface micromachining applications, an algorithm and associated design tool have been created which translates designers’ 3D models into 2D lithographic production masks. Typically, designing a surface micromachined, MEMS device requires the creation of a two-dimensional mask set describing how layers of material are used to construct the three-dimensional object. Mask sets are specific to a fixed production process and are effectively the tooling required to manufacture a device. This design tool was developed and implemented such that when given a three-dimensional object it can infer from the object’s topology the two-dimensional masks needed to produce that object with surface micromachining. The masks produced by this design tool can be generic, process independent masks or, if given process constraints, specific for a target process allowing 3D designs to be carried across multiple processes.
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ISBN:	0-9728422-8-4
Pages:	519
Hardcopy:	$79.95

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