Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1

Wafer and MEMS Processing Chapter 11

Planarize the Sidewall Ripples of Silicon Deep Reactive Ion Etching
K-Y Weng, M-Y Wang and P-H Tsai
Industrial Technology Research Institute, TW

Process Factors in the Reduction of Output Conductance in Sub-micron CMOS
N.C. May, H.S. Tan and A.V. Kordesch
SILTERRA (M) SDN BHD, MY

Inverse RIE Lag of Silicon Deep Etching
C.K. Chung and H.N. Chiang
National Cheng Kung University, TW

Microscope Slide Electrode Chamber for Nanosecond, Megavolt-Per-Meter Biological Investigations
Y. Sun, P.T. Vernier, M. Behrend, L. Marcu and M.A. Gundersen
University of Southern California, US

Numerical Analysis of Nano-imprinting Process Based on Continuum Hypothesis
H.C. Kim, Y.S. Woo, W.I. Lee, S.I. Oh and B.S. Kim
School of Mechanical and Aerospace Engineering, Seoul National University., KR


ISBN: 0-9728422-7-6
Pages: 521
Hardcopy: $79.95