 | Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 11: Wafer and MEMS Processing |
| - | Planarize the Sidewall Ripples of Silicon Deep Reactive Ion Etching |
| | K-Y Weng, M-Y Wang and P-H Tsai |
| | Industrial Technology Research Institute, TW |
| - | Process Factors in the Reduction of Output Conductance in Sub-micron CMOS |
| | N.C. May, H.S. Tan and A.V. Kordesch |
| | SILTERRA (M) SDN BHD, MY |
| - | Inverse RIE Lag of Silicon Deep Etching |
| | C.K. Chung and H.N. Chiang |
| | National Cheng Kung University, TW |
| - | Microscope Slide Electrode Chamber for Nanosecond, Megavolt-Per-Meter Biological Investigations |
| | Y. Sun, P.T. Vernier, M. Behrend, L. Marcu and M.A. Gundersen |
| | University of Southern California, US |
| - | Numerical Analysis of Nano-imprinting Process Based on Continuum Hypothesis |
| | H.C. Kim, Y.S. Woo, W.I. Lee, S.I. Oh and B.S. Kim |
| | School of Mechanical and Aerospace Engineering, Seoul National University., KR |
| ISBN: | 0-9728422-7-6 |
| Pages: | 521 |
| Hardcopy: | $150.00 |
| Special: | 3 CD Set — 15% off with Free Shipping |
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| Order: | Mail/Fax Form |
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