Ferrofluid Masking for Lithographic Applications

	Nanotech 2004 Vol. 1 Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1 Chapter 10: Micro and Nano Structuring and Assembly
	Ferrofluid Masking for Lithographic Applications
Authors:	B. Yellen and G. Friedman
Affilation:	Drexel University, US
Pages:	451 - 454
Keywords:	ferrofluid, self-assembly, self-aligning, masking
Abstract:	A novel self-aligned “soft masking” method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.
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ISBN:	0-9728422-7-6
Pages:	521
Hardcopy:	$79.95

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