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 | Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1
Chapter 10: Micro and Nano Structuring and Assembly |
| | Ferrofluid Masking for Lithographic Applications | | Authors: | B. Yellen and G. Friedman | | Affilation: | Drexel University, US | | Pages: | 451 - 454 | | Keywords: | ferrofluid, self-assembly, self-aligning, masking | | Abstract: | A novel self-aligned “soft masking” method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure. | | ISBN: | 0-9728422-7-6 |
| Pages: | 521 |
| Hardcopy: | $150.00 |
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