Nano Science and Technology Institute
Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1
 
Chapter 10: Micro and Nano Structuring and Assembly
 

Ferrofluid Masking for Lithographic Applications

Authors:B. Yellen and G. Friedman
Affilation:Drexel University, US
Pages:451 - 454
Keywords:ferrofluid, self-assembly, self-aligning, masking
Abstract:A novel self-aligned “soft masking” method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.
Ferrofluid Masking for Lithographic ApplicationsView PDF of paper
ISBN:0-9728422-7-6
Pages:521
Hardcopy:$79.95
 
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