Nanotech 2004 Vol. 1
Nanotech 2004 Vol. 1
Technical Proceedings of the 2004 NSTI Nanotechnology Conference and Trade Show, Volume 1

Micro and Nano Structuring and Assembly Chapter 10

Ferrofluid Masking for Lithographic Applications

Authors: B. Yellen and G. Friedman

Affilation: Drexel University, United States

Pages: 451 - 454

Keywords: ferrofluid, self-assembly, self-aligning, masking

Abstract:
A novel self-aligned “soft masking” method that is compatible with traditional photolithographic processes is demonstrated. This method uses a suspension of ultra-fine iron oxide grains (ferrofluid) to protect or de-protect selected areas of a magnetically patterned substrate according to a programmable sequence. Automatic mask formation and registration is controlled by ferromagnetic alignment marks patterned on a substrate. External magnetic field bias applied to the system causes ferrofluid to aggregate only over designated areas on the surface, thereby masking those areas from UV or chemical exposure.

Ferrofluid Masking for Lithographic Applications

ISBN: 0-9728422-7-6
Pages: 521
Hardcopy: $79.95