Nano Science and Technology Institute
Nanotech 2003 Vol. 3
Nanotech 2003 Vol. 3
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 3
 
Chapter 7: Nano Devices and Systems
 

Electron Sources for Massively Parallel Electron Beam Lithography System using Single Vertically Aligned Carbon Nanofiber Cathodes

Authors:M.A. Guillorn, J.H. Whealton, L.R. Baylor, A.V. Melechko, V.I. Merkulov, D.K. Hensley, M.D. Hale, R.J. Kasica, D.H. Lowndes and M.L. Simpson
Affilation:Oak Ridge National Laboratory, US
Pages:346 - 349
Keywords:nanofiber, field emission, nanoscale devices
Abstract:Electron beam lithography using a single beam cannot achieve acceptable throughput levels to become a viable manufacturing technology. The digital electrostatic e-beam array lithography (DEAL) concept under development at the Oak Ridge National Laboratory proposes circumventing this problem by writing simultaneously with millions of e-beams from a massively parallel and digitally programmable array of microfabricated electron sources. Such a system will require a robust field emission (FE) source capable of stable operation in moderate vacuum. In previous work we have shown that microfabricated FE sources using a single vertically aligned carbon nanofiber (VACNF) cathode are well suited for this application1. The ability to synthesize individual VACNF deterministically and incorporate them into conventional fabrication processes distinguishes this material from other nanostructured graphitic carbon-based FE cathodes. We have realized multi-electrode FE devices using the VACNF cathode technology. Here we present the design, fabrication and characterization of prototype electrostatically focused FE electron sources intended for use in the DEAL system.
Electron Sources for Massively Parallel Electron Beam Lithography System using Single Vertically Aligned Carbon Nanofiber CathodesView PDF of paper
ISBN:0-9728422-2-5
Pages:560
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