Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 2
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 2

RF Device Design Chapter 8

Fabrication of 3-Dimesional Cu Coaxial Cylinder using Porous Silicon MEMS Technology

Authors: D.S Eun, Y.M. Kim, CH.H. Bae, J.H. Lee

Affilation: Kyungpook National University, Korea

Pages: 400 - 403

Keywords: coaxial

Abstract:
Therefore, this paper reports 3-dimensional Cu coaxial cylinder with a thick OPS(oxidized porous silicon) in low resistivity silicon for application of microwave and RF integrated circuit technology. A novel on-chip 3D coaxial cylinder was fabricated by bulk and surface micromachined process. It was utilized deformation of sacrificial photoresist and electroplating and etching. In conclusion, we propose a novel 3-D coaxial cylinder structure fabricated by anodic reaction, electroplating, and micromachining technology. The structure is expected to improve the insertion loss characteristics, the transmission line dispersion characteristics and can be used as micro-size coaxial cylinder.

Fabrication of 3-Dimesional Cu Coaxial Cylinder using Porous Silicon MEMS Technology

ISBN: 0-9728422-1-7
Pages: 600