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 | Nanotech 2003 Vol. 2
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 2
Chapter 2: Molecular Electronics |
| | Atomic-control Placement of Individual P atoms in Si for the Fabrication of a Quantum Computer Qubit Array | | Authors: | S.R. Schofield, N.J. Curson, M.Y. Simmons, T. Hallam, F.J. Ruess, L. Oberbeck and R.G. Clark | | Affilation: | University of New South Wales, AU | | Pages: | 68 - 71 | | Keywords: | quantum computer, fabrication, silicon, lithography, STM, single atom | | Abstract: | The ability to control the location of individual dopant atoms within a semiconductor has enormous potential for the creation of atomic-scale electronic devices. One of the most ambitious proposals for such a device is the solid-state quantum computer proposed by Kane, which requires the fabrication of a regularly-spaced array of individual P atoms as qubits, ~20 nm apart in a Si substrate. Here, we demonstrate the incorporation of individual P atoms into the surface of a Si substrate at controlled spatial locations, predefined with atomic-precision using a scanning tunneling microscope. A hydrogen monolayer was used as a lithographic resist, which was patterned by desorbing H from the surface with the STM tip. Phosphine precursor molecules were then adsorbed to the exposed areas of bare Si surface. The P atoms from these adsorbed molecules were then incorporated into the Si surface by performing a critical anneal to ~350 °C. Using this technique we demonstrate the creation of both continuous nanometer-wide lines of incorporated P atoms, and single P atom incorporation with a positional accuracy of order 1 nm. These results represent the first demonstration of controlled single dopant atom incorporation in Si at the atomic-scale. |  | View paper | | ISBN: | 0-9728422-1-7 |
| Pages: | 600 |
| Hardcopy: | $125.00 |
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