Nanotech 2003 Vol. 2
Nanotech 2003 Vol. 2
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 2

Semiconductors Chapter 1

High Speed Extraction of Process Model Parameters for 70nm Technology using a Distributed Genetic Algorithm

Authors: M. Murakawa, Y. Oda, H. Amakawa, S. Baba, T. Higuchi and K. Nishi

Affilation: AIST, Japan

Pages: 60 - 63

Keywords: model calibration, genetic algorithm, parallel computation, B implantation, dual-Pearson profile

Abstract:
In this paper, we show, for the first time, GA application to process model calibration. We propose a distributed GA based calibration technique combined with the traditional local optimization algorithm, which reduces time for calibration considerably. Experimental results show calibration of 144 parameters can be completed with a few minutes, whereas it typically takes a human expert a few days. Our algorithm can be easily implemented on a coarse-grain parallel computer such as a PC cluster system or a multi processor workstation. GA, thus, can be a practical and robust tool for process/device calibration.

High Speed Extraction of Process Model Parameters for 70nm Technology using a Distributed Genetic Algorithm

ISBN: 0-9728422-1-7
Pages: 600