 | Nanotech 2003 Vol. 1
Technical Proceedings of the 2003 Nanotechnology Conference and Trade Show, Volume 1
Chapter 13: Wafer and MEMS Processing |
A New, Topology Driven Method for Automatic Mask Generation from Three-Dimensional Models | |
| Authors: | R. Schiek and R. Schmidt |
| Affilation: | Sandia National Laboratories, US |
| Pages: | 506 - 509 |
| Keywords: | mask generation, topology, mems design |
| Abstract: | We have developed an algorithm which when given a three-dimensional object can infer from the objects topology the two-dimensional masks needed to produce that object with surface micromachining.Our algorithm, called Faethm, calculates the required two-dimensional mask set needed to produce a given three-dimensional model. Unlike earlier approaches, this algorithm does not involve the creation of trial masks that are iterated through a process simulator [2, 4] Nor does this method use a geometry decomposition that is limited to non-isotropic etching processes [1]. Rather, the basis of Faethm is an analysis of the vertical topology of the three-dimensional model coupled with a constrained optimization to meet specific production process requirements.This algorithm has been developed with Sandias SUMMiT~V process [3] as an initial design goal though it can be adapted to other processes as only the constrained optimization step would change. Validation of this algorithm has started with three-dimensional models and two-dimensional mask sets of parts common to the SUMMiT~V process such as connectors, gears, transmissions, actuators and motors. |
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| ISBN: | 0-9728422-0-9 |
| Pages: | 560 |
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