Authors: M.K. Long, J.W. Burdick and E.K. Antonsson
Affilation: California Institute of Technology, United States
Pages: 124 - 127
Keywords: compensation structures, anisotropic etching, wet etching, bulk etching
Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask layouts for wet etching.This paper extends that work to broader classes of corner compensation and demonstrates the encoding of a specific compensation structure uch that it may be used with other orientation or process parameters.