Nano Science and Technology Institute
MSM 99
MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Chapter 4: Process Modeling

Design of Compensation Structures for Anisotropic Etching

Authors:M.K. Long, J.W. Burdick and E.K. Antonsson
Affilation:California Institute of Technology, US
Pages:124 - 127
Keywords:compensation structures, anisotropic etching, wet etching, bulk etching
Abstract:Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask layouts for wet etching.This paper extends that work to broader classes of corner compensation and demonstrates the encoding of a specific compensation structure uch that it may be used with other orientation or process parameters.
Design of Compensation Structures for Anisotropic EtchingView PDF of paper
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