Design of Compensation Structures for Anisotropic Etching

	MSM 99 Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems Chapter 4: Process Modeling
	Design of Compensation Structures for Anisotropic Etching
Authors:	M.K. Long, J.W. Burdick and E.K. Antonsson
Affilation:	California Institute of Technology, US
Pages:	124 - 127
Keywords:	compensation structures, anisotropic etching, wet etching, bulk etching
Abstract:	Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask layouts for wet etching.This paper extends that work to broader classes of corner compensation and demonstrates the encoding of a specific compensation structure uch that it may be used with other orientation or process parameters.
	View PDF of paper
ISBN:	0-9666135-4-6
Pages:	697
Up