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 | MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Chapter 4: Process Modeling |
| | Design of Compensation Structures for Anisotropic Etching | | Authors: | M.K. Long, J.W. Burdick and E.K. Antonsson | | Affilation: | California Institute of Technology, U.S.A. | | Pages: | 124 - 127 | | Keywords: | compensation structures, anisotropic etching, wet etching, bulk etching | | Abstract: | Due to the highly anisotropic behavior of ilicon bulk etching,there have been many publications on etch simulation and convex corner compensation for specific geometries. Our previous work introduced a general framework for algorithmically synthesizing mask layouts for wet etching.This paper extends that work to broader classes of corner compensation and demonstrates the encoding of a specific compensation structure uch that it may be used with other orientation or process parameters. |  | View paper | | ISBN: | 0-9666135-4-6 |
| Pages: | 697 |
| Hardcopy: | $100.00 |
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