Mask-Layout Synthesis Through an Evolutionary Algorithm

	MSM 99 Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems Chapter 4: Process Modeling
	Mask-Layout Synthesis Through an Evolutionary Algorithm
Authors:	H. Li and E.K. Antonsson
Affilation:	California Institute of Technology, US
Pages:	113 - 116
Keywords:	MEMS, design, synthesis, genetic algorithm, bulk wet etching
Abstract:	An automatic method for synthesizing MEMS mask-lay-outs is presented. This method uses evolutionary algorithm techniques to optimize the mask-layouts for a forward simu-lation of fabrication. Initially, a random population of mask-layouts is generated. The fabrication of each layout is sim-ulated through a digital process simulator to produce a 3D fabricated shape, which is compared to a user-specified desired shape. Each evolutionary loop governs the stochastic searching behavior such that the mask-layouts whose simu-lated shapes are closer to the desired shape are more likely to survive. More importantly, the ìbetterî masks are more likely to be evolved among those survived mask-layouts for the next loop. Through such evolutionary iterations, a near global ìoptimumî mask-layout is likely to be found. A test loop is constructed for the bulk wet etching mask synthesis by incorporating a 3D wet etching simulator. The current emerging results demonstrate the feasibility of this approach to mask-layout synthesis.
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ISBN:	0-9666135-4-6
Pages:	697
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