MSM 99
MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems

Process Modeling Chapter 4

A Program for Modeling of Technological Routes of VLSI Fabrication - ProMIC-T

Authors: V. Tesluk and O. Korbetskyy

Affilation: Lvov Polytechnic, Ukraine

Pages: 99 - 101

Keywords: numerical simulation of IC process, diffusion, oxidation, route, step, transition

Abstract:
A technological process of the VLSI fabrication constantly improves. In such conditions, new technology and constructive problems appear when making IC with submicron sizes. Decision for these problems is possible only by using CAD tools, particlarly mathematical modeling. It allows considerably to accelerate a process of the integrated devices design and reduce expenses on the technological complete of the silicon IC's fabrication routes.


ISBN: 0-9666135-4-6
Pages: 697

2015 & Newer Proceedings

Nanotech Conference Proceedings are now published in the TechConnect Briefs

NSTI Online Community