Authors: Z. Wang, Y. Li and J.B. Adams
Affilation: Arizona State University, United States
Pages: 455 - 458
Keywords: kinetic lattice Monte Carlo simulation, thin film growth, Cu
We present a Kinetic Lattice Monte Carlo (KLMC) model, which describes deposition, surface self-diffusion, nucleation, and film growth on fcc metal substrates. The activation energies for diffusion are calculated using embedded-atom method (EAM). Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size.