![]() | MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Chapter 13: Metallization Modeling |
Modeling Facet Growth of Cu Thin Films | |
| Authors: | Z. Wang, Y. Li and J.B. Adams |
| Affilation: | Arizona State University, US |
| Pages: | 455 - 458 |
| Keywords: | kinetic lattice Monte Carlo simulation, thin film growth, Cu |
| Abstract: | We present a Kinetic Lattice Monte Carlo (KLMC) model, which describes deposition, surface self-diffusion, nucleation, and film growth on fcc metal substrates. The activation energies for diffusion are calculated using embedded-atom method (EAM). Using this model, we determine the relative growth rates of (100), (110) and (111) facets as a function of substrate temperature, deposition rate and facet size. |
![]() | View PDF of paper |
| ISBN: | 0-9666135-4-6 |
| Pages: | 697 |
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