Nano Science and Technology Institute
MSM 99
MSM 99
Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems
Chapter 10: Implant and Diffusion Modeling

Linking of Atomistic Modeling to Macroscopic Behavior for Front End Processes

Authors:S.T. Dunham
Affilation:Boston University, US
Pages:355 - 358
Keywords:diffusion, point defects, lattice Monte Carlo, transient enhanced diffusion, extended defects
Abstract:In this work, we review efforts to make effective use of atomistic calculations for the advancement of VLSI process simulation. We focus on front-end processes such as defect mediated dopant diffusion which play a large role in determining device behavior.
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