Linking of Atomistic Modeling to Macroscopic Behavior for Front End Processes

	MSM 99 Technical Proceedings of the 1999 International Conference on Modeling and Simulation of Microsystems Chapter 10: Implant and Diffusion Modeling
	Linking of Atomistic Modeling to Macroscopic Behavior for Front End Processes
Authors:	S.T. Dunham
Affilation:	Boston University, US
Pages:	355 - 358
Keywords:	diffusion, point defects, lattice Monte Carlo, transient enhanced diffusion, extended defects
Abstract:	In this work, we review efforts to make effective use of atomistic calculations for the advancement of VLSI process simulation. We focus on front-end processes such as defect mediated dopant diffusion which play a large role in determining device behavior.
ISBN:	0-9666135-4-6
Pages:	697
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