Simulating 3-Dimensional Deep X-ray Lithography Using the CXrL Toolset

	MSM 98 Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems Chapter 8: Software Systems and Tools
	Simulating 3-Dimensional Deep X-ray Lithography Using the CXrL Toolset
Authors:	G. Aigeldinger, B. Craft and W. Menz
Affilation:	Louisiana State University, US
Pages:	374 - 379
Keywords:	lithography, simulation, 3-dimensional, xray, synchrotron
Abstract:	Experimental evaluation of the dose distribution resulting from 3-dimensional deep x-ray lithography is often impractical. Computer modeling is a valuable tool for simulating this system. Preliminary simulations of 3-dimensional, deep, xray lithography exposures have been performed using the CXrL Toolset t2]. External computer programs have been developed to allow various manipulations of the resist volume between successive exposures. The first pair of routines allow a cubic volume of resist to be rotated by 90 degrees about either of two orthogonal axes. These have been used to simulate the exposures required to generate a 'six-way cross'. First experiments producing a six-way cross have been conducted at the NSLS. The second set of routines supports the simulation of exposures where the x-rays enter the resist at nonnormal incidence. A 'valve seat' with the geometry of a truncated pyramid has been simulated.
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ISBN:	0-96661-35-0-3
Pages:	678
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