MSM 98
MSM 98
Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems

Bulk and Topography Processing Chapter 2

Molecular Dynamics (MD) Simulations of Reactive Ion Etching (RIE) of Silicon by Cl, Cl2, Br and Br2 Cations
S.M. Valone, D.E. Hanson and J.D. Kress
Los Alamos National Laboratory, US

Computer Aided Mask-Layout for Bulk Etch Fabrication
M.K Long, J.W. Burdick and E.K. Antonsson
California Institute of Technology, US

A Semi-Empirical Resist Dissolution Model for Sub-micron Lithographies
M. Khan, S.B. Bollepalli and F. Cerrina
UW-Madison, US

A Method of MOSFET Dopant Profile Prediction and its Use in Transistor Design
M. Kulkarni, K. Vasanath, J. Davis, S. Saxena and G. Pollack
Texas Instruments, Inc., US

Modeling Image Formation in Layered Structures: Application to X-ray Lithography
S.B. Bollepalli, M. Khan and F. Cerrina
UW-Madison, US

Numerical Simulation for the Sacrificial Release of MEMS Square Diaphragms
W.J. Li, J.C. Shih, J.D. Mai, C-M. Ho, J. Liu and Y-C. Tai
UC-Los Angeles, US

Three-Dimensional Simulation of Bulge Formation in Contact Hole Metalization
W. Pyka and S. Selberherr
Technical UniversityVienna, AT


ISBN: 0-96661-35-0-3
Pages: 678