Nano Science and Technology Institute
MSM 98
MSM 98
Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems
Chapter 1: Plenary Lectures

Challenges in Process Modeling for MEMS

Authors:R.W. Dutton, E.K. Chan, N.W. Wilson, Z-K Hsiau and S. Shen
Affilation:Stanford University, US
Pages:1 - 4
Keywords:geometry modeling, process simulation
Abstract:The potency of the silicon IC technology base, its use of CAD for design targeted for manufacturing and the related challenges faced in deployment of MEMS are discussed. The rapidly growing field of MEMS has created opportunities to merge new functional capabilities with integrated circuit (IC) electronics. MEMS fabrication uniquely requires accurate prediction of both geometry and materials dependencies that affect electrical, mechanical and other structurally constrained behavior.
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