MSM 98
MSM 98
Technical Proceedings of the 1998 International Conference on Modeling and Simulation of Microsystems

Plenary Lectures Chapter 1

Challenges in Process Modeling for MEMS

Authors: R.W. Dutton, E.K. Chan, N.W. Wilson, Z-K Hsiau and S. Shen

Affilation: Stanford University, United States

Pages: 1 - 4

Keywords: geometry modeling, process simulation

Abstract:
The potency of the silicon IC technology base, its use of CAD for design targeted for manufacturing and the related challenges faced in deployment of MEMS are discussed. The rapidly growing field of MEMS has created opportunities to merge new functional capabilities with integrated circuit (IC) electronics. MEMS fabrication uniquely requires accurate prediction of both geometry and materials dependencies that affect electrical, mechanical and other structurally constrained behavior.

Challenges in Process Modeling for MEMS

ISBN: 0-96661-35-0-3
Pages: 678