Authors: N. Strecker, V. Moroz and M. Jaraiz
Affilation: Avant!, United States
Pages: 462 - 465
Keywords: Monte Carlo, diffusion, process, simulation, TCAD
Advantages and disadvantages of the alternative approaches to the dopant diffusion simulation are discussed. Complementary use of the Monte Carlo and continuum diffusion models is suggested. Application of the integrated commercially available process simulation tools DADOS (atomistic) and Taurus Process (continuum) to the advanced sub-100 nm devices is demonstrated. The following four application areas for the Monte Carlo diffusion model are discussed: 1. Determining model parameters for the continuum process simulation. 2. Complete Monte Carlo path from implantation to diffusion for investigating statistical device variations. 3. Usage of DADOS integrated into Taurus Process for the accurate diffusion simulation in the entire simulation domain or a small window in the most critical device part. 4. Exploration of the new materials and species for the novel devices and process steps.