Nano Science and Technology Institute
Nanotech 2002 Vol. 1
Nanotech 2002 Vol. 1
Technical Proceedings of the 2002 International Conference on Modeling and Simulation of Microsystems
Chapter 8: Process Modeling

Gas Flow Simulation in a PECVD Reactor

Authors:A.N.R. da Silva and N.I. Morimoto
Affilation:LSI – EPUSP, BR
Pages:434 - 437
Keywords:PECVD, CFD, gas flow simulation
Abstract:In this work are presented the gas flo simulation in a hand made PECVD-TEOS reactor. We used the FLOTRAN-CFD code of the ANSYS simulator to predict the velocity and temperature curves in the reactor. The results showed high influence of the reactor geometry and the deposition process pressure in the velocity distribution curves.
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