Gas Flow Simulation in a PECVD Reactor

	Nanotech 2002 Vol. 1 Technical Proceedings of the 2002 International Conference on Modeling and Simulation of Microsystems Chapter 8: Process Modeling
	Gas Flow Simulation in a PECVD Reactor
Authors:	A.N.R. da Silva and N.I. Morimoto
Affilation:	LSI – EPUSP, BR
Pages:	434 - 437
Keywords:	PECVD, CFD, gas flow simulation
Abstract:	In this work are presented the gas flo simulation in a hand made PECVD-TEOS reactor. We used the FLOTRAN-CFD code of the ANSYS simulator to predict the velocity and temperature curves in the reactor. The results showed high influence of the reactor geometry and the deposition process pressure in the velocity distribution curves.
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ISBN:	0-9708275-7-1
Pages:	764
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